Display panels

ABSTRACT

A display panel includes a first substrate; a scan line and a data line disposed on the first substrate and extending in a first direction and a second direction, respectively, wherein the data line intersects the scan line; a polysilicon layer disposed on the first substrate. In a top view, the polysilicon layer includes: a first channel region overlapping a portion of the scan line; a second channel region overlapping another portion of the scan line; a non-channel region not overlapping the scan line and connected between the first channel region and the second channel region; a long region extended in the second direction; wherein a portion of the non-channel region extends in the first direction, the portion has a first width in the second direction, the long region has a second width in the first direction, and the first width is greater than the second width.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of pending U.S. patent applicationSer. No. 17/329,652, filed on May 25, 2021, now U.S. Pat. No.11,372,299, which is a Continuation of pending U.S. patent applicationSer. No. 16/846,524, filed on Apr. 13, 2020, now U.S. Pat. No.11,048,131, which is a Continuation of U.S. patent application Ser. No.15/868,294, filed on Jan. 11, 2018, now abandoned, which is aContinuation of U.S. patent application Ser. No. 14/830,036, filed Aug.19, 2015, now U.S. Pat. No. 9,897,879, which claims priority of TaiwanPatent Application No. 104100493, filed on Jan. 8, 2015, the entirety ofwhich is incorporated by reference herein.

BACKGROUND Field of the Invention

The present invention relates to display panel technology, and inparticular to the active layer pattern design of the display panelswhich have an active layer of a thin-film transistor (TFT).

Description of the Related Art

In recent years, liquid-crystal displays (LCDs) have become the mostcommonly used plane displays and have been extensively applied invarious kinds of electronic devices due to their advantages, whichinclude being thin, being lightweight, having low power consumption,having low radiation, etc. In an active-matrix LCD, the TFT acts as adriving device for the control of pixel switching. Based on thematerials of an active layer of the TFTs, there are many kinds of TFTssuch as an amorphous silicon TFT, or a polycrystalline silicon TFT.

However, with regard to TFTs of LCDs, there are still many improvementsthat are required in the formation of the active layer of TFTs to allowthe LCDs to achieve a better display quality.

BRIEF SUMMARY

According to some embodiments of the disclosure, display panels areprovided to improve an active layer of TFTs. By using the pattern widthdesign of the active layer, the entire resistance of the active layer isreduced. The electrical properties of TFTs are thereby improved, and theimage display quality of the display panels is also enhanced.

In some embodiments of the disclosure, a display panel is provided. Thedisplay panel includes a first substrate, and scan lines intersectingwith data lines and disposed on the first substrate. An active layer isdisposed on the first substrate and between the data lines and the firstsubstrate. A transparent conductive layer is disposed on the firstsubstrate and above the active layer. The active layer includes a firstcontact region electrically connected to the data lines, a secondcontact region electrically connected to the first transparentconductive layer and an intermediate region between the first and secondcontact regions. The intermediate region includes a first channel regionoverlapping with the scan lines and a non-channel region not overlappingwith the scan lines, and the non-channel region has a width that isgreater than the width of the first channel region.

In some embodiments of the disclosure, a display panel is provided. Thedisplay panel includes a first substrate; a scan line and a data lineintersecting with each other to form an intersecting region and disposedon the first substrate, wherein the scan line extends in a firstdirection; and an active layer disposed on the first substrate andbetween the data line and the first substrate. The active layer includesa first contact region electrically connected to the data line through afirst via hole, a first channel region overlapping a portion of the scanline, a second channel region overlapping another portion of the scanline, and a non-channel region not overlapping the scan line andconnected between the first channel region and the second channelregion. At least a portion of an outline of the non-channel region hasan arc shape.

In some embodiments of the disclosure, a display panel is provided. Thedisplay panel includes a first substrate. A scan line and a data lineare disposed on the first substrate, wherein the scan line extends in afirst direction, and the data line extends in a second direction andintersects the scan line. An active layer is disposed on the firstsubstrate and between the data line and the first substrate. In a topview, the active layer includes a first channel region overlapping aportion of the scan line; a second channel region overlapping anotherportion of the scan line; a non-channel region not overlapping the scanline and connected between the first channel region and the secondchannel region; a long region extended in the second direction; aturning region disposed between the long region and the first channelregion. A portion of the non-channel region extends in the firstdirection, the portion has a first width in the second direction, thelong region has a second width in the first direction, and the firstwidth is greater than the second width.

A detailed description is given in the following embodiments withreference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention can be more fully understood by reading thesubsequent detailed description and examples with references made to theaccompanying drawings, wherein:

FIG. 1 shows a partial plane view of a display panel according to someembodiments of the disclosure;

FIG. 2 shows a partial cross section of a display panel, along the line2-2′ shown in FIG. 1 , according to some embodiments of the disclosure;

FIG. 3 shows a partial plane view of a display panel according to someembodiments of the disclosure;

FIG. 4 shows a partial cross section of a display panel, along the line4-4′ shown in FIG. 3 , according to some embodiments of the disclosure;

FIG. 5 shows a partial plane view of a display panel according to someother embodiments of the disclosure; and

FIG. 6 shows a partial plane view of a display panel according to someother embodiments of the disclosure.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 1 shows a partial plane view of a display panel 100 according tosome embodiments of the disclosure. The display panel 100 includes aplurality of scan lines 140 intersecting with a plurality of data lines150, and disposed on the first substrate (not shown in FIG. 1 ) todefine a plurality of sub-pixel areas. In the embodiment, the sub-pixelareas are the areas enclosed by the two adjacent data lines and the twoadjacent scan lines. TFTs are disposed near the intersecting position ofthe scan lines 140 and the data lines 150. The TFTs are switchingdevices for controlling the sub-pixel areas and are electricallyconnected to the data lines. According to an embodiments of thedisclosure, the TFT includes an active layer 130 made of low-temperaturepolysilicon (LTPS). The active layer 130 includes a first contact region1301, a second contact region 1302, and an intermediate region 1303between the first and second contact regions, 1301 and 1302. The portionof the intermediate region 1303 of the active layer 130 overlapping thescan line 140 produces two channel regions, which are the first channelregion 1308 and the second channel region 1309. The portion of theintermediate region 1303 of the active layer 130 not overlapping thescan line 140 is a non-channel region such as a first non-channel region1304 on the upper side of the scan line 140 near the data line, a secondnon-channel region 1305 on the upper side of the scan line 140 far awayfrom the data line, and a third non-channel region 1306 on the undersideof the scan line 140 shown in FIG. 1 .

In addition, as shown in FIG. 1 , in some embodiments, the display panel100 further includes a second transparent conductive layer 120 which isused as a top transparent conductive layer. In the embodiments, thesecond transparent conductive layer 120 is used as a common electrode,and the second transparent conductive layer 120 has a plurality of slits122 formed therein. The second transparent conductive layer 120 coversthe scan line 140, data line 150, and the active layer 130. In someembodiments, the second transparent conductive layer 120 covers a viahole 115 in the first contact region 1301 of the active layer 130 andvia holes 117 and 119 in the second contact region 1302 of the activelayer 130. In some other embodiments, the second transparent conductivelayer 120 can have an opening (not shown in FIG. 1 ) near the locationsof the via holes 117 and 119. The opening of the second transparentconductive layer 120 is near the second contact region 1302 to avoid thesecond transparent conductive layer 120 covering the via holes 117 and119. In the embodiments, the data line 150 has a non-linear wiring type,and the data line 150 is essentially extended in a direction. In otherembodiments, the data line 150 can have a linear wiring type. In theembodiments, the scan line 140 has a linear wiring type. In otherembodiments, the scan line 140 can have a non-linear wiring type, andthe scan line 140 has an essentially extension direction.

As shown in FIG. 1 , the first channel region 1308 has a first width W1,the second channel region 1309 has a second width W2, and the firstwidth W1 and the second width W2 are essentially extended in a directionparallel to the scan line 140. The portion of the intermediate region1303 between the first channel region 1308 and the second channel region1309 (namely, a third non-channel region 1306) has a third width W3. Thethird width W3 is a perpendicular distance between a first side 1303-L1and a second side 1303-L2 of the intermediate region 1303. The firstside 1303-L1 is the inner side of the intermediate region 1303 of theactive layer 130. The second side 1303-L2 is the outer side of theintermediate region 1303 of the active layer 130.

According to the embodiments of the disclosure, the third width W3 ofthe third non-channel region 1306 is greater than the first width W1 ofthe first channel region 1308, and the third width W3 of the thirdnon-channel region 1306 is also greater than the second width W2 of thesecond channel region 1309. In addition, according to the embodiments ofthe disclosure, the first non-channel region 1304 and the secondnon-channel region 1305 of the intermediate region 1303 not overlappingthe scan line 140 have widths that are greater than the first width W1of the first channel region 1308. The width of the first non-channelregion 1304 and the second non-channel region 1305 are also greater thanthe second width W2 of the second channel region 1309. In the embodimentof the disclosure, the width of each portion of the intermediate region1303 is defined as the perpendicular distance between the two sides1303-L1 and 1303-L2 of the intermediate region 1303. Accordingly, thedirections of the widths of some portions of the intermediate region1303 may not be parallel to the extension direction of the scan line140.

In order to satisfy the requirement that the TFT be used as a pixelswitching device, the length-to-width ratio of the first channel region1308 and the length-to-width ratio of the second channel region 1309produced by the active layer 130 of the TFT overlapping the scan line140 need to be maintained within a certain range. Accordingly, the firstwidth W1 of the first channel region 1308 and the second width W2 of thesecond channel region 1309 need to satisfy the design requirements ofthe resolution of display panels to the channel's length-to-width ratioof the TFT. In a known manufacturing technology of display panels,except for the contact regions, the other parts of the active layer ofthe TFT have an identical width. The width of the active layer isusually formed to satisfy the requirements of the length-to-width ratioof the channel regions. However, the resistance of the active layerwhich is made this way cannot be reduced, and the performance of theTFTs cannot be enhanced.

According to the embodiments of the disclosure, the widths of the firstnon-channel region 1304, the second non-channel region 1305, and thethird non-channel region 1306 of the active layer 130 are greater thanthe width of the first channel region 1308 and are also greater than thewidth of the second channel region 1309. Thus, the pattern of the activelayer 130 has a width change wherein the non-channel region is wider andthe channel region is narrower. Because the first non-channel region1304, the second non-channel region 1305, and the third non-channelregion 1306 have greater widths, the entire resistance of the activelayer 130 made of LTPS is reduced. At the same time, the widths of thefirst channel region 1308 and the second channel region 1309 alsosatisfy the requirements of the length-to-width ratio for the channelregions of the TFTs. Accordingly, the embodiment of the disclosure canenhance the electrical performance of the TFTs.

In some embodiments, as shown in FIG. 1 , the third non-channel region1306 between the first channel region 1308 and the second channel region1309 of the intermediate region 1303 has two protruding parts 1307. Thetwo protruding parts 1307 protrude outward from the first channel region1308 and the second channel region 1309 respectively in a direction thatis parallel to the scan line 140. Moreover, in some embodiments, thewidth W1 of the first channel region 1308 may be approximately the sameas the width W2 of the second channel region 1309. In some otherembodiments, the width W1 of the first channel region 1308 is differentfrom the width W2 of the second channel region 1309. Furthermore, asshown in FIG. 1 , in some embodiments, the data line 150 can be a dataline with curves. To be more specific, an outline of the data line 150corresponding to the via hole 115 has an arc shape. The distance betweenthe first contact region 1301 of the active layer 130 and the scan line140 is not much different from the distance between the second contactregion 1302 of the active layer 130 and the scan line 140. The activelayer 130 with a short length of the intermediate region 1303 is thenformed.

Referring to FIG. 2 , a partial cross section of a display panel 100along the line 2-2′ shown in FIG. 1 according to some embodiments isshown. As shown in FIG. 2 , the display panel 100 includes a firstsubstrate 101. A scan line 140 and a data line 150 are disposed on thefirst substrate 101. An active layer 130 is disposed on the firstsubstrate 101 and under the data line 150 and the scan line 140. Theactive layer 130 is disposed between the data line 150 and the firstsubstrate 101. In some embodiments, the TFTs of the display panel 100can have a top-gate structure, as shown in FIG. 2 , and a channel regionproduced by the scan line (gate) 140 overlapping with the active layer130 is located above the active layer 130. In some other embodiments,the TFTs of the display panel can have a bottom-gate structure, and achannel region produced by a scan line (gate) overlapping with an activelayer is located under the active layer.

Referring to FIGS. 1 and 2 , a via hole 115 is formed over the firstcontact region 1301 of the active layer 130. The first contact region1301 of the active layer 130 is electrically connected to the data line150 through the via hole 115. In addition, as shown in FIG. 2 , thedisplay panel 100 further includes a first transparent conductive layer110. Via holes 117 and 119 are formed over the second contact region1302 of the active layer 130. The second contact region 1302 of theactive layer 130 is electrically connected to the first transparentconductive layer 110 through the via holes 117 and 119. The via hole 115is formed by forming a hole in a first insulating layer 126 and a secondinsulating layer 128 above the first contact region 1301 of the activelayer 130, and the metal materials forming the data line 150 fill in thehole of the via hole 115. As a result, the data line 150 is electricallyconnected to the first contact region 1301 of the active layer 130through the via hole 115. In addition, a portion of the data line 150forms a source electrode of the TFT. Moreover, the via hole 117 isformed by forming a hole in the first insulating layer 126 and thesecond insulating layer 128 above the second contact region 1302 of theactive layer 130, and the metal materials forming a drain electrode 152of the TFT are electrically connected to the active layer 130 throughthe via hole 117. Furthermore, the via hole 119 is formed by forming ahole in a third insulating layer 132 over the second insulating layer128, and the materials forming the first transparent conductive layer110 fill in the hole of the via hole 119. As a result, the firsttransparent conductive layer 110 is electrically connected to the drainelectrode 152 of the TFT through the via hole 119, and is electricallyconnected to the second contact region 1302 of the active layer 130through the via hole 117. The first insulating layer 126 and the secondinsulating layer 128 can be made of the same or different inorganicmaterials, such as SiOx or SiNx.

As shown in FIG. 2 , the first insulating layer 126 is disposed betweendual gates formed of the scan line 140 and the active layer 130. Thesecond insulating layer 128 and the third insulating layer 132 areformed over the scan line 140. The via hole holes 115 and 117 are formedin the first insulating layer 126 and the second insulating layer 128.The via hole 119 is formed in the third insulating layer 132. In someembodiments, a portion of the transparent conductive layer 110 isconformally formed in the via hole 119 of the third insulating layer132. The metal materials forming the source electrode of the TFT can beconformally formed in the via hole 115. The metal materials forming thedrain electrode 152 of the TFT can also be conformally formed in the viahole 117. The third insulating layer 132 can be organic materials usedfor planarization, such as an organic material like poly fluoroalkoxy(PFA) or a color filter material.

The display panel 100 further includes a second substrate 102, and adisplay medium layer 136 is disposed between the second substrate 102and the first substrate 101. In some embodiments, the display mediumlayer 136 can be a liquid crystal layer, the second substrate 102 is acolor filter (CF) substrate, and the first substrate 101 is a TFT arraysubstrate. In some other embodiments, a CF layer can be disposed on thefirst substrate 101. For example, the third insulating layer 132 can bereplaced by a CF material.

In some embodiments, as shown in FIGS. 1 and 2 , the display panel 100further includes a second transparent conductive layer 120 disposedabove the first transparent conductive layer 110. A fourth insulatinglayer 134 is disposed between the first transparent conductive layer 110and the second transparent conductive layer 120. The first transparentconductive layer 110 is electrically insulated from the secondtransparent conductive layer 120 by the fourth insulating layer 134. Thefourth insulating layer 134 can be made of inorganic materials, such assilicon oxide (SiOx) or silicon nitride (SiNx). In some embodiments, thesecond transparent conductive layer 120 is a patterned electrodeincluding a plurality of slits 122. The display panel 100 can be afringe field switching (FFS) wide-angle LCD panel due to the dispositionof the slits 122 of the second transparent conductive layer 120 and thefirst transparent conductive layer 110. In the embodiments, the slits122 do not exceed the range of the sub-pixel area. In other embodiments,the slits 122 can exceed the range of the sub-pixel area, for example,the slits 122 can exceed the data line 150 or they can exceed the scanline 140.

FIG. 3 shows a partial plane view of a display panel 100 according tosome other embodiments. The intermediate region 1303 of the active layer130 overlapping the scan line 140 produces two channel regions i.e., thefirst channel region 1308 and the second channel region 1309. Theportions of the intermediate region 1303 of the active layer 130 notoverlapping the scan line 140 are a first non-channel region 1304, asecond non-channel region 1305, and a third non-channel region 1306.According to the embodiments of the disclosure, the widths of the firstnon-channel region 1304, the second non-channel region 1305, and thethird non-channel region 1306 are greater than widths of the firstchannel region 1308 and the second channel region 1309. Thus, thepattern of the active layer 130 has a width change wherein thenon-channel region is wider and the channel region is narrower. Theresistance of the active layer is thereby reduced.

As shown in FIG. 3 , in some embodiments, the first contact region 1301of the active layer 130 is farther away from the scan line 140 than thesecond contact region 1302 of the active layer 130. As a result, thefirst non-channel region 1304 between the first contact region 1301 andthe scan line 140 has a longer length. Since the first non-channelregion 1304 is longer than the third non-channel region 1306, the firstcontact region 1301 and the second contact region 1302 are staggered.Because the contact region needs a larger area to allow for an alignmenterror in the process, the two contact regions which are staggered canmake these two contact regions be closer to each other in a directionthat is substantially parallel to the scan line 140. Therefore, thewidth of single sub-pixel in the direction that is substantiallyparallel to the scan line 140 can be reduced. However, because the firstnon-channel region 1304 is long if the width of the first non-channelregion 1304 is fixed, it would reduce the amount of sub-pixels and thedesign requirements pertaining to the resolution of the display panelsis thereby limited. Accordingly, the first non-channel region 1304 hasdifferent widths (but they are wider than that of the channel region) tomaintain the resistance thereof and reduce the effect on the apertureratio of the display panels.

In some embodiments, as shown in FIG. 3 , the data line 150 can be astraight data line, and the intermediate region 1303 of the active layer130 partially overlaps the data line 150. As a result, the portions ofthe intermediate region 1303 which are not overlapped with the data line150 include a first area 1311 and a second area 1312 disposed at twosides of the data line 150, respectively. The second area 1312 isdisposed between the data line 150 and the second contact region 1302,and the first area 1311 is disposed on another side of the data line 150that is opposite to the second area 1312. The first area 1311 has awidth W4, and the second area 1312 has a width W5. The directions of thewidths W4 and W5 are parallel to the essentially extension direction ofthe scan line 140. In some embodiments, the width W4 of the first area1311 is approximately equal to the width W5 of the second area 1312. Insome other embodiments, the width W4 of the first area 1311 can begreater than the width W5 of the second area 1312. In some otherembodiments, the width W4 of the first area 1311 can be smaller than thewidth W5 of the second area 1312.

Compared to examples in which the active layer and the data line aretotally overlapped, in some embodiments of the disclosure, theintermediate region 1303 of the active layer 130 partially overlaps thedata line 150. As a result, the parasitic capacitance produced betweenthe active layer 130 and the data line 150 is reduced. In addition,compared to example wherein the active layer and the data line do notoverlap at all, in some embodiments of the disclosure, the intermediateregion 1303 of the active layer 130 partially overlaps the data line150. As a result, the aperture ratio of the display panels is increased.

In addition, in some embodiments, as shown in FIG. 3 , the firstnon-channel region 1304 of the intermediate region 1303 of the activelayer 130 has a width W6 near the first contact region 1301. The secondnon-channel region 1305 of the intermediate region 1303 has a width W7near the second contact region 1302. The width W6 is greater than thewidth W7. Moreover, in some embodiments, the first contact region 1301has a width W8, and the second contact region 1302 has a width W9. Thewidth W9 is greater than the width W8. In some embodiments, thedirections of the aforementioned widths W4˜W9 are approximately parallelto the essentially extension direction of the scan line 140.

FIG. 4 shows a partial cross section of a display panel 100 along theline 4-4′ shown in FIG. 3 according to some embodiments of thedisclosure. As shown in FIG. 4 , in some embodiments, the firsttransparent conductive layer 110 that is electrically connected to thesecond contact region 1302 of the active layer 130 is a patternedelectrode including a plurality of slits 113. A second transparentconductive layer 120 is disposed under the first transparent conductivelayer 110. The second transparent conductive layer 120 has an opening125 near the second contact region 1302. The disposition of the opening125 prevents the second transparent conductive layer 120 from coveringthe via hole 119, thereby avoiding the position of the via hole 119. Inthe embodiments, the display panel 100 is a FFS LCD panel due to thedisposition of the slits 113 of the first transparent conductive layer110 and the second transparent conductive layer 120.

FIG. 5 shows a partial plane view of a display panel 100 according tosome other embodiments of the disclosure. As shown in FIG. 5 , in someembodiments, the first contact region 1301 of the active layer 130 isfarther away from the scan line 140. As a result, the first non-channelregion 1304 of the intermediate region 1303 that is disposed between thefirst contact region 1301 and the scan line 140 has a long length. Inaddition, in the embodiment of FIG. 5 , the data line 150 can have acurved wiring type, and the data line 150 has an essentially extensiondirection. As a result, the intermediate region 1303 of the active layer130 partially overlaps the data line 150. The intermediate region 1303includes two areas disposed on two sides of the data line 150. In theembodiments, the area of the intermediate region 1303 disposed on theleft side of the data line 150 has a larger width than the area of theintermediate region 1303 disposed on the right side of the data line150. Moreover, as shown in FIG. 5 , the via hole 117 in the secondcontact region 1302 of the active layer 130 has a bottom edge (alsocalled a lower edge of the via hole) 117-1 and a top edge (also calledan upper edge of the via hole) 117-2. The area surrounded by the bottomedge 117-1 is smaller than the area surrounded by the top edge 117-2.Accordingly, as shown in the plane view of FIG. 5 , the via hole 117 hastwo cyclic boundaries. The via hole 115 and the via hole 119 also have atop edge and a bottom edge. FIGS. 1, 3, and 5 only show the top edges ofthe via holes.

As shown in the embodiments of FIG. 5 , the widths of the firstnon-channel region 1304, the second non-channel region 1305, and thethird non-channel region 1306 produced by the portions of theintermediate region 1303 of the active layer 130 that are not overlappedwith the scan line 140 are greater than the widths of the first channelregion 1308, and the second channel region 1309 produced by the portionsof the intermediate region 1303 that are overlapped with the scan line140. As a result, the pattern of the active layer 130 has a width changewherein the non-channel region is wider and the channel region isnarrower. The effects of reducing the resistance and the parasiticcapacitance of the active layer are achieved.

Furthermore, the first transparent conductive layer and the secondtransparent conductive layer of the display panel 100 are not shown inFIG. 5 . In some embodiments, the display panel 100 of FIG. 5 can usethe patterned electrode of the second transparent conductive layer 120including the slits 122 shown in FIG. 1 to form a FFS LCD panel. In someother embodiments, the display panel 100 of FIG. 5 can use the patternedelectrode of the first transparent conductive layer 110 including theslits 113 shown in FIG. 3 to form a FFS LCD panel.

Referring to FIG. 6 , a partial plane view of a display panel 100according to some other embodiments of the disclosure is shown. As shownin FIG. 6 , in some embodiments, the first contact region 1301 of theactive layer 130 is near the scan line 140. As a result, the firstnon-channel region 1304 and the second non-channel region 1305 that arelocated between the first contact region 1301 and the second contactregion 1302 have short lengths. However, the length of the firstnon-channel region 1304 is greater than the length of the secondnon-channel region 1305. As a result, the positions of the first contactregion 1301 and the second contact region 1302 are staggered to reducethe influence on the resolution of the display panels. Because thecontact region needs a big area, if two contact regions are aligned, itpossibly requires a large sub-pixel width (that is parallel to theessentially extension direction of the scan line) to contain the firstcontact region 1301 and the second contact region 1302. It will limitthe amount of sub-pixels, and the requirement that the display panelshave high resolution is thereby impacted. In the embodiments, a portionof the intermediate region 1303 of the active layer 130 near the firstcontact region 1301 has a width W6, and a portion of the intermediateregion 1303 near the second contact region 1302 has a width W7. Thewidth W6 is greater than the width W7. In addition, the scan line 140and the data line 150 can have a straight line pattern. In some otherembodiments, the scan line 140 and the data line 150 can have anon-straight line pattern. The scan line 140 and the data line 150respectively have an essentially extension direction.

Moreover, as shown in FIG. 6 , the via hole 117 in the second contactregion 1302 of the active layer 130 has a bottom edge (also called alower edge of the via hole) 117-1 and a top edge (also called an upperedge of the via hole) 117-2. The area surrounded by the bottom edge117-1 is smaller than the area surrounded by the top edge 117-2. The viahole 119 in the second contact region 1302 of the active layer 130 alsohas a bottom edge (also called a lower edge of the via hole) 119-1 and atop edge (also called an upper edge of the via hole) 119-2. The areasurrounded by the bottom edge 119-1 is smaller than the area surroundedby the top edge 119-2. Accordingly, as shown in the plane view of FIG. 6, each of the via hole 117 and the via hole 119 has two cyclicboundaries. In other embodiments, the via holes can have a non-circularshape, such as an oval or an irregular shape.

As shown in the embodiments of FIG. 6 , the widths of the firstnon-channel region 1304, the second non-channel region 1305, and thethird non-channel region 1306 produced by the portions of theintermediate region 1303 of the active layer 130 that are not overlappedwith the scan line 140 are greater than the widths of the first channelregion 1308, and the second channel region 1309 produced by the portionsof the intermediate region 1303 that are overlapped with the scan line140. As a result, the pattern of the active layer 130 has a width changewherein the non-channel region is wider and the channel region isnarrower. The effects of reducing the resistance and the parasiticcapacitance of the active layer are thereby achieved.

Furthermore, the first transparent conductive layer and the secondtransparent conductive layer of the display panel 100 are not shown inFIG. 6 . In some embodiments, the display panel 100 of FIG. 6 can usethe patterned electrode of the second transparent conductive layer 120including the slits 122 shown in FIG. 1 . In some other embodiments, theslits 122 of the second transparent conductive layer 120 in the displaypanel 100 of FIG. 6 are continuing to exceed over the data line or thescan line, depending on design requirements. In some other embodiments,the display panel 100 of FIG. 6 can use the patterned electrode of thefirst transparent conductive layer 110 including the slits 113 shown inFIG. 3 to form a FFS LCD panel.

In summary, according to some embodiments of the disclosure, the patternof the active layer of the TFTs in the display panel is improved,especially for the active layer made of LTPS. The widths of thenon-channel regions are greater than the widths of the channel regions.The non-channel regions are produced by the intermediate region notoverlapping the scan line. The intermediate region is located betweenthe first contact region and the second contact region of the activelayer. The channel regions are produced by the intermediate regionoverlapping the scan line. As a result, the pattern of the active layerhas a width change wherein the non-channel region is wider and thechannel region is narrower. The effects of reducing the resistance andthe parasitic capacitance of the active layer are thereby achieved. Theelectrical performance of the TFTs is enhanced.

While the disclosure has been described by way of example and in termsof the embodiments, it is to be understood that the disclosure is notlimited to the disclosed embodiments. On the contrary, it is intended tocover various modifications and similar arrangements (as would beapparent to those skilled in the art). Therefore, the scope of theappended claims should be accorded the broadest interpretation so as toencompass all such modifications and similar arrangements.

What is claimed is:
 1. An electronic panel, comprising: a firstsubstrate; a first conductive line and a second conductive line disposedon the first substrate, wherein the first conductive line extends alonga first direction, and the second conductive line extends along a seconddirection and intersects the first conductive line; an active layerdisposed on the first substrate and between the second conductive lineand the first substrate, wherein in a top view, the active layercomprises: a first overlapping region overlapping a portion of the firstconductive line; a second overlapping region overlapping an anotherportion of the first conductive line; a first non-overlapping region notoverlapping the first conductive line and connected between the firstoverlapping region and the second overlapping region; a secondnon-overlapping region extending along the second direction; and a firstcontact region electrically connected to a connecting portion of thesecond conductive line through a first via hole; wherein a portion ofthe first non-overlapping region extends along the first direction, theportion of the first non-overlapping region has a first minimum width inthe second direction, the second non-overlapping region has a secondminimum width in the first direction, and the first minimum width isgreater than the second minimum width, wherein the connecting portion ofthe second conductive line overlaps the first contact region of theactive layer and the first via hole, and an outline of the connectingportion of the second conductive line has an arc shape.
 2. Theelectronic panel of claim 1, wherein the first conductive line and thesecond conductive line intersect each other to form an intersectingregion and a width of the first contact region in the first direction isgreater than a width of the intersecting region in the first direction.3. The electronic panel of claim 1, wherein the first conductive lineand the second conductive line intersect each other to form anintersecting region and a width of the second conductive linecorresponding to the first contact region in the first direction isdifferent from a width of the second conductive line in the intersectingregion.
 4. The electronic panel of claim 1, wherein an outline of theactive layer has an arc shape.
 5. The electronic panel of claim 1,wherein the active layer further comprises a third non-overlappingregion extending along the second direction, wherein the secondnon-overlapping region has a first length in the second direction, thethird non-overlapping region has a second length in the seconddirection, and the first length is different from the second length. 6.The electronic panel of claim 5, wherein the second non-overlappingregion overlaps the second conductive line.
 7. The electronic panel ofclaim 1, wherein the active layer further comprises a second contactregion, wherein an area of the second contact region is different froman area of the first contact region.